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Download Free sampleThe global Atomic Layer Deposition Equipment (ALD) market was valued at 188.44 Million USD in 2021 and will grow with a CAGR of 5.2% from 2021 to 2027, based on Research newly published report.
The prime objective of Atomic Layer Deposition Equipment Market is to provide the insights on the post COVID-19 impact which will help market players in this field evaluate their business approaches. Also, Atomic Layer Deposition Equipment Market covers market segmentation by major market verdors, types, applications/end users and geography(North America, East Asia, Europe, South Asia, Southeast Asia, Middle East, Africa, Oceania, South America).
Atomic Layer Deposition Equipment (ALD) is a versatile research deposition tool for thermal or energy enhanced ALD. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors. ALD is a key process in fabricating semiconductor devices, and part of the set of tools for synthesising nanomaterials.Global Atomic Layer Deposition Equipment (ALD) key players include ASM International, Tokyo Electron, Lam Research, etc. Global top three manufacturers hold a share over 70%. China is the largest market, with a share about 30%, followed by North America, Japan and Korea, both have a share about 45 percent. In terms of product, Industrial Production Equipment is the largest segment, with a share over 85%. And in terms of application, the largest application is Semiconductor and Integrated Circuits Industry, followed by PV Industry, etc.
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