High Purity Titanium Sputtering Target Market

The titanium sputtering target is made of titanium metal. It is a low-strength, high-strength metal with good ductility (especially in an oxygen-free environment), gloss and metallic white. The high melting point (above 1,650?C or 3,000?F) makes it useful as a refractory metal. Industrial grade titanium sputtering targets and arc cathodes are used for decorative coatings, and high-purity titanium sputtering targets with a purity of up to 99.999% are usually used in integrated circuits, DRAM and flat panel display applications. When high-purity titanium is used to sputter LSI, VLSI and ULSI circuit networks, these integrated components can be made lighter, thinner, smaller in size and denser in wiring.
High Purity Titanium Sputtering Target Market contains market size and forecasts of High Purity Titanium Sputtering Target in global, including the following market information:
Global High Purity Titanium Sputtering Target Market Revenue, 2017-2022, 2023-2028, ($ millions)
Global High Purity Titanium Sputtering Target Market Sales, 2017-2022, 2023-2028, (Ton)
Global top five High Purity Titanium Sputtering Target companies in 2021 (%)
The global High Purity Titanium Sputtering Target market was valued at million in 2021 and is projected to reach US$ million by 2028, at a CAGR of % during the forecast period.
The U.S. Market is Estimated at $ Million in 2021, While China is Forecast to Reach $ Million by 2028.
4N Segment to Reach $ Million by 2028, with a % CAGR in next six years.
The global key manufacturers of High Purity Titanium Sputtering Target include Honeywell, Tosoh, JX Nippon Mining & Metals, Praxair, Matsurf Technologies Inc, Testbourne Ltd, ULVAC, Inc., Plasmaterials Inc and Materion, etc. In 2021, the global top five players have a share approximately % in terms of revenue.
We surveyed the High Purity Titanium Sputtering Target manufacturers, suppliers, distributors and industry experts on this industry, involving the sales, revenue, demand, price change, product type, recent development and plan, industry trends, drivers, challenges, obstacles, and potential risks.
Total Market by Segment:
Global High Purity Titanium Sputtering Target Market, by Type, 2017-2022, 2023-2028 ($ Millions) & (Ton)
Global High Purity Titanium Sputtering Target Market Segment Percentages, by Type, 2021 (%)
4N
5N
Others
Global High Purity Titanium Sputtering Target Market, by Application, 2017-2022, 2023-2028 ($ Millions) & (Ton)
Global High Purity Titanium Sputtering Target Market Segment Percentages, by Application, 2021 (%)
ICs
DRAM
Flat Panel Display
Others
Global High Purity Titanium Sputtering Target Market, By Region and Country, 2017-2022, 2023-2028 ($ Millions) & (Ton)
Global High Purity Titanium Sputtering Target Market Segment Percentages, By Region and Country, 2021 (%)
North America
US
Canada
Mexico
Europe
Germany
France
U.K.
Italy
Russia
Nordic Countries
Benelux
Rest of Europe
Asia
China
Japan
South Korea
Southeast Asia
India
Rest of Asia
South America
Brazil
Argentina
Rest of South America
Middle East & Africa
Turkey
Israel
Saudi Arabia
UAE
Rest of Middle East & Africa
Competitor Analysis
The report also provides analysis of leading market participants including:
Key companies High Purity Titanium Sputtering Target revenues in global market, 2017-2022 (Estimated), ($ millions)
Key companies High Purity Titanium Sputtering Target revenues share in global market, 2021 (%)
Key companies High Purity Titanium Sputtering Target sales in global market, 2017-2022 (Estimated), (Ton)
Key companies High Purity Titanium Sputtering Target sales share in global market, 2021 (%)
Further, the report presents profiles of competitors in the market, key players include:
Honeywell
Tosoh
JX Nippon Mining & Metals
Praxair
Matsurf Technologies Inc
Testbourne Ltd
ULVAC, Inc.
Plasmaterials Inc
Materion
Vacuum Engineering and Materials Co
Ningbo Jiang Feng Electronic Materials Co., Ltd.
Kurt J. Lesker Company